Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the future

Jonckheere, RikRikJonckheereLorusso, GianGianLorussoGoethals, MiekeMiekeGoethalsRonse, KurtKurtRonseHermans, JanJanHermansDe Ruyter, RudiRudiDe Ruyter2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12369Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the futureProceedings paper