Vankerckhoven, H.H.VankerckhovenDe Smedt, FrankFrankDe SmedtClaes, MartineMartineClaesDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeynsVinckier, ChrisChrisVinckier2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/8342Effect of additives on the removal efficiency of photoresist by ozone/Di-water processes; experimental studyProceedings paper