Depth profiling of ZrO2/SiO2/Si stacks-TOF-SIMS and computer simulation study

Ignatova, V.A.V.A.IgnatovaConard, ThierryThierryConardMoeller, W.W.MoellerVandervorst, WilfriedWilfriedVandervorstGijbels, R.R.Gijbels2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7680Depth profiling of ZrO2/SiO2/Si stacks-TOF-SIMS and computer simulation studyMeeting abstract