Formation of fluorocarbon polymer and its removal in back-end-of-line processing of advanced CMOS integrated circuits

Le, Quoc ToanQuoc ToanLeVereecke, GuyGuyVereeckeKesters, ElsElsKestersStruyf, HerbertHerbertStruyfDe Gendt, StefanStefanDe Gendt2021-10-202021-10-202012-11https://imec-publications.be/handle/20.500.12860/20993Formation of fluorocarbon polymer and its removal in back-end-of-line processing of advanced CMOS integrated circuitsMeeting abstract