GAFM characterization of the dependence of HfAlOx electrical behavior on post-deposition annealing temperature

Blasco, X.X.BlascoPetry, JasmineJasminePetryNafria, M.M.NafriaAymerich, X.X.AymerichRichard, OlivierOlivierRichardVandervorst, WilfriedWilfriedVandervorst2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/8592GAFM characterization of the dependence of HfAlOx electrical behavior on post-deposition annealing temperatureJournal article