Ercken, MoniqueMoniqueErckenMoelants, MyriamMyriamMoelantsVandenberghe, GeertGeertVandenbergheGoethals, MiekeMiekeGoethalsRonse, KurtKurtRonseMasuda, SeiyaSeiyaMasudaSpiess, WalterWalterSpiessPawlowski, G.G.Pawlowski2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4361Optimization of an advanced positive tone DUV photoresist towards 150nm and beyondJournal article