Attenuated phase shifting masks in combination with off-axis illumination: A way towards quarter micron DUV lithography for random logic operations

Ronse, KurtKurtRonsePforr, RainerRainerPforrBaik, Ki-HoKi-HoBaikJonckheere, RikRikJonckheereVan den hove, LucLucVan den hove2021-09-292021-09-291994https://imec-publications.be/handle/20.500.12860/316Attenuated phase shifting masks in combination with off-axis illumination: A way towards quarter micron DUV lithography for random logic operationsJournal article