Evaluation of the degree of damage after different conditions of He/H2 dry strip plasma on silica-based porous low-k materials - compatiblity study with chemical solutions

Kesters, ElsElsKestersLe, Quoc ToanQuoc ToanLeBoullart, WernerWernerBoullartHan, Q.Q.HanBerry, I.I.BerryWaldfried, C.C.WaldfriedMertens, PaulPaulMertensHeyns, MarcMarcHeyns2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10687Evaluation of the degree of damage after different conditions of He/H2 dry strip plasma on silica-based porous low-k materials - compatiblity study with chemical solutionsProceedings paper