Low damage cryoetching of low-K materials

Dussart, RemiRemiDussartTillocher, ThomasThomasTillocherLeroy, FlorianeFlorianeLeroyLefaucheux, PhilippePhilippeLefaucheuxyatsuda, koichikoichiyatsudaMaekawa, KaoruKaoruMaekawaNishimura, EiichiEiichiNishimuraZhang, LipingLipingZhangde Marneffe, Jean-FrancoisJean-Francoisde MarneffeBaklanov, MikhaïlMikhaïlBaklanov2021-10-222021-10-222015https://imec-publications.be/handle/20.500.12860/25237Low damage cryoetching of low-K materialsMeeting abstract