Wafer thermal desorption spectrometry in a rapid thermal processor using atmospheric pressure ionization mass spectrometry

Vereecke, GuyGuyVereeckeKondoh, EiichiEiichiKondohRichardson, PaulPaulRichardsonMaex, KarenKarenMaexHeyns, MarcMarcHeyns2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4907Wafer thermal desorption spectrometry in a rapid thermal processor using atmospheric pressure ionization mass spectrometryJournal article