Plasma modification of Hf based high-k dielectrics: effect of nitridation and silicon nitride deposition

Tsai, W.W.TsaiMaes, J.W.J.W.MaesDe Witte, HildeHildeDe WitteChen, J.J.ChenDelabie, AnneliesAnneliesDelabieCarter, RichardRichardCarterRichard, OlivierOlivierRichardCaymax, MattyMattyCaymaxConard, ThierryThierryConardYoung, EdwardEdwardYoungDe Gendt, StefanStefanDe Gendt2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9691Plasma modification of Hf based high-k dielectrics: effect of nitridation and silicon nitride depositionProceedings paper