Nanoindentation study of thin plasma enhanced chemical vapor depoosition SiCOH low-k films modified in He/H2 downstream plasma

Vanstreels, KrisKrisVanstreelsUrbanowicz, AdamAdamUrbanowicz2021-10-182021-10-1820101071-1023https://imec-publications.be/handle/20.500.12860/18243Nanoindentation study of thin plasma enhanced chemical vapor depoosition SiCOH low-k films modified in He/H2 downstream plasmaJournal article