Wet chemical processing of Ge in acidic H2O2 solution: nanoscale etching and surface chemistry

Abrenica, GranielGranielAbrenicaFingerle, MathiasMathiasFingerleLebedev, MikhailMikhailLebedevArnauts, SophiaSophiaArnautsMayer, ThomasThomasMayerHolsteyns, FrankFrankHolsteynsDe Gendt, StefanStefanDe Gendtvan Dorp, DennisDennisvan Dorp2021-10-282021-10-2820202162-8769https://imec-publications.be/handle/20.500.12860/34586Wet chemical processing of Ge in acidic H2O2 solution: nanoscale etching and surface chemistryJournal articlehttps://doi.org/10.1149/2162-8777/abb1c5