Grillaert, JoostJoostGrillaertMeuris, MarcMarcMeurisVrancken, EviEviVranckenHeylen, NancyNancyHeylenDevriendt, KatiaKatiaDevriendtFyen, WimWimFyenHeyns, MarcMarcHeyns2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4403Modelling the influence of pad bending on the planarization performance during CMPProceedings paper