Quantified Uniformity and Selectivity of TiO2 Films in 45-nm Half Pitch Patterns Using Area-Selective Deposition Supercycles

Nye, RachelRachelNyeVan Dongen, KaatKaatVan Dongende Marneffe, Jean-FrancoisJean-Francoisde MarneffeParsons, Gregory N. N.Gregory N. N.ParsonsDelabie, AnneliesAnneliesDelabie2023-12-152023-06-252023-12-1520232196-7350WOS:001007482600001https://imec-publications.be/handle/20.500.12860/42091Quantified Uniformity and Selectivity of TiO2 Films in 45-nm Half Pitch Patterns Using Area-Selective Deposition SupercyclesJournal article10.1002/admi.202300163WOS:001007482600001ATOMIC LAYER DEPOSITIONRUTHENIUM