Cu/LKD-5109 damascene integration demonstration using FF-02 low-k spin-on hard-mask and embedded etch-stop

Kokubo, TerukazuTerukazuKokuboDas, ArabindaArabindaDasFurukawa, YukikoYukikoFurukawaVos, IngridIngridVosIacopi, FrancescaFrancescaIacopiStruyf, HerbertHerbertStruyfVan Aelst, JokeJokeVan AelstMaenhoudt, MireilleMireilleMaenhoudtTokei, ZsoltZsoltTokeiVervoort, IwanIwanVervoortBender, HugoHugoBenderStucchi, MicheleMicheleStucchiSchaekers, MarcMarcSchaekersBoullart, WernerWernerBoullartVan Hove, MarleenMarleenVan HoveVanhaelemeersch, SergeSergeVanhaelemeerschPeterson, WilliamWilliamPetersonShiota, A.A.ShiotaMaex, KarenKarenMaex2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6493Cu/LKD-5109 damascene integration demonstration using FF-02 low-k spin-on hard-mask and embedded etch-stopProceedings paper