Measurement and analysis of EUV photoresist related outgassing and contamination

Pollentier, IvanIvanPollentierAksenov, GermanGermanAksenovGoethals, MiekeMiekeGoethalsGronheid, RoelRoelGronheidJonckheere, RikRikJonckheereLeeson, MichaelMichaelLeeson2021-10-182021-10-182009https://imec-publications.be/handle/20.500.12860/16031Measurement and analysis of EUV photoresist related outgassing and contaminationProceedings paper