Rezvanov, A.A.RezvanovMogilnikov, K.K.MogilnikovGutshin, O.O.GutshinGornev, E.E.GornevKrasnikov, G.G.KrasnikovZhang, LipingLipingZhangDussarrat, C.C.Dussarratde Marneffe, Jean-FrancoisJean-Francoisde MarneffeBaklanov, MikhaïlMikhaïlBaklanov2021-10-222021-10-222015https://imec-publications.be/handle/20.500.12860/25817Adsorption isobars of fluorocarbon compounds selected for cryogenic etching of low-k materialsMeeting abstract