Van Den Heuvel, DieterDieterVan Den HeuvelFoubert, PhilippePhilippeFoubertBaudemprez, BartBartBaudemprezLee, AngelicaAngelicaLeeCross, AndrewAndrewCrossSao, KaushikKaushikSaoHaque, NaoshinNaoshinHaqueParisi, PaoloPaoloParisiBaris, OksinOksinBaris2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/27446Process window discovery methodology development for advanced lithographyProceedings paperhttp://ieeexplore.ieee.org/document/7491105/