Resist roughness evaluation and frequency analysis: metrological challenges and potential solutions for EUV lithography

Vaglio Pret, AlessandroAlessandroVaglio PretGronheid, RoelRoelGronheidIshimoto, ToruToruIshimotoSekiguchi, KoheiKoheiSekiguchi2021-10-182021-10-1820101537-1646https://imec-publications.be/handle/20.500.12860/18129Resist roughness evaluation and frequency analysis: metrological challenges and potential solutions for EUV lithographyJournal article