Hydrogen diffusion in silicon from plasma-enhanced chemical vapor deposited silicon nitride film at high temperature

Sheoran, M.M.SheoranKim, D.S.D.S.KimRohatgi, A.A.RohatgiDekkers, HaroldHaroldDekkersBeaucarne, GuyGuyBeaucarneYoung, M.M.YoungAsher, S.S.Asher2021-10-172021-10-1720080003-6951https://imec-publications.be/handle/20.500.12860/14463Hydrogen diffusion in silicon from plasma-enhanced chemical vapor deposited silicon nitride film at high temperatureJournal article