Goethals, MiekeMiekeGoethalsFoubert, PhilippePhilippeFoubertHosokawa, KoheiKoheiHosokawaVan Roey, FriedaFriedaVan RoeyNiroomand, ArdavanArdavanNiroomandVan Den Heuvel, DieterDieterVan Den HeuvelPollentier, IvanIvanPollentier2021-10-202021-10-2020120914-9244https://imec-publications.be/handle/20.500.12860/20730EUV resist process performance investigations on the NXE 3100 full field scannerJournal article