Kittl, JorgeJorgeKittlVeloso, AnabelaAnabelaVelosoLauwers, AnneAnneLauwersKottantharayil, AnilAnilKottantharayilDemeurisse, CarolineCarolineDemeurisseKubicek, StefanStefanKubicekNiwa, MasaakiMasaakiNiwaVan Dal, MarkMarkVan DalRichard, OlivierOlivierRichardKmieciak, MalgorzataMalgorzataKmieciakJurczak, GosiaGosiaJurczakVrancken, ChristaChristaVranckenChiarella, ThomasThomasChiarellaBrus, StephanStephanBrusMaex, KarenKarenMaexBiesemans, SergeSergeBiesemans2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10702Scalability of Ni FUSI gate processes: phase and Vt control to 30 nm gate lengthsProceedings paper