Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-chi Block Copolymers

Pound-Lana, GwenaelleGwenaellePound-LanaBezard, PhilippePhilippeBezardPetit-Etienne, CamilleCamillePetit-EtienneCavalaglio, SebastienSebastienCavalaglioCunge, GillesGillesCungeCabannes-Boue, BenjaminBenjaminCabannes-BoueFleury, GuillaumeGuillaumeFleuryChevalier, XavierXavierChevalierZelsmann, MarcMarcZelsmann2023-08-092023-06-202023-08-0920211944-8244WOS:000710924900083https://imec-publications.be/handle/20.500.12860/41957Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-chi Block CopolymersJournal article10.1021/acsami.1c13503WOS:000710924900083MEDLINE:34636239