Myers, AlanAlanMyersLorusso, GianGianLorussoKim, In SungIn SungKimGoethals, MiekeMiekeGoethalsJonckheere, RikRikJonckheereHermans, JanJanHermansBaudemprez, BartBartBaudemprezRonse, KurtKurtRonse2021-10-172021-10-1720081071-1023https://imec-publications.be/handle/20.500.12860/14204Experimental validation of full-field extreme ultraviolet lithography flare and shadowing correctionsJournal article