Tadatomo, HirokiHirokiTadatomoDauendorffer, ArnaudArnaudDauendorfferOnitsuka, TomoyaTomoyaOnitsukaGenjima, HisashiHisashiGenjimaIdo, YasuyukiYasuyukiIdoOkada, SoichiroSoichiroOkadaKuwahara, YuheiYuheiKuwaharaHara, ArisaArisaHaraDinh, CongqueCongqueDinhFujimoto, SeijiSeijiFujimotoKawakami, ShinichiroShinichiroKawakamiMuramatsu, MakotoMakotoMuramatsuShimura, SatoruSatoruShimuraNafus, KathleenKathleenNafusOikawa, NoriakiNoriakiOikawaOno, KentaKentaOnoFeurprier, YannickYannickFeurprierDemand, MarcMarcDemandNegreira, Ainhoa RomoAinhoa RomoNegreiraNagahara, SeijiSeijiNagaharaBlanco, VictorVictorBlancoFoubert, PhilippePhilippeFoubertDe Simone, DaniloDaniloDe Simone2023-01-042022-09-082023-01-042022978-1-5106-4987-30277-786XWOS:000844514700014https://imec-publications.be/handle/20.500.12860/40392Approaches to Enable Patterning of Tight Pitches towards High NA EUVProceedings paper10.1117/12.2614012978-1-5106-4988-0WOS:000844514700014