Dependence of electric potential at trench surfaces on ion angula distribution in plasma etching processes

Palov, AAPalovMankelevich, YYMankelevichRakhimova, TTRakhimovaBaklanov, MikhaïlMikhaïlBaklanov2021-10-232021-10-2320160022-3727https://imec-publications.be/handle/20.500.12860/27112Dependence of electric potential at trench surfaces on ion angula distribution in plasma etching processesJournal article