Characterization of slurry system and suppression of oxide erosion in aluminun CMP (chemical-mechanical planarization)

Zhong, L.L.ZhongYang, G.G.YangHolland, K.K.HollandGrillaert, JoostJoostGrillaertDevriendt, KatiaKatiaDevriendtHeylen, NancyNancyHeylenMeuris, MarcMarcMeuris2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4975Characterization of slurry system and suppression of oxide erosion in aluminun CMP (chemical-mechanical planarization)Proceedings paper