Gentile, MarzioMarzioGentileGerlach, MariusMariusGerlachRichter, RobertRobertRichtervan Setten, MichielMichielvan SettenPetersen, JohnJohnPetersenvan der Heide, PaulPaulvan der HeideHolzmeier, FabianFabianHolzmeier2023-11-072023-07-282023-11-072023978-1-5106-6103-50277-786XWOS:001022961000016https://imec-publications.be/handle/20.500.12860/42229Dissociative photoionization of EUV lithography photoresist modelsProceedings paper10.1117/12.2657702978-1-5106-6104-2WOS:001022961000016