Kim, Hyun-WooHyun-WooKimDelvaux, ChristieChristieDelvauxBaerts, ChristinaChristinaBaertsGronheid, RoelRoelGronheidFoubert, PhilippePhilippeFoubertKishimura, ShinjiShinjiKishimuraErcken, MoniqueMoniqueErcken2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10696Effect of water on resist performance beyond resolution enhancement in 193nm immersion lithographyProceedings paper