A Laboratory Light Source for Ultrafast Kinetics of EUV Exposure Processes and Ultra-Small Pitch Lithography

Cousin, Seth L.Seth L.CousinBargsten, ClaytonClaytonBargstenRinard, EricEricRinardWard, RodRodWardHosler, ErikErikHoslerPetersen, BrennanBrennanPetersenKapteyn, HenityHenityKapteynVanelderen, PieterPieterVanelderenPetersen, JohnJohnPetersenvan der Heide, PaulPaulvan der Heide2022-01-252021-11-022022-01-2520202160-9020WOS:000612090002193https://imec-publications.be/handle/20.500.12860/38187A Laboratory Light Source for Ultrafast Kinetics of EUV Exposure Processes and Ultra-Small Pitch LithographyProceedings paper978-1-943580-76-7WOS:000612090002193