Rassoul, NouredineNouredineRassoulJourdain, AnneAnneJourdainTutunjyan, NinaNinaTutunjyanDe Vos, JoeriJoeriDe VosSardo, StefanoStefanoSardoInoue, FumihiroFumihiroInouePiumi, DanieleDanielePiumiMiller, AndyAndyMillerBeyne, EricEricBeyneWalsby, EdwardEdwardWalsbyJash Patel, PatelPatelJash PatelOliver, AnsellAnsellOliverHuma, AshrafAshrafHumaJanet, HopkinsHopkinsJanetDave, ThomasThomasDave2021-10-242021-10-242017https://imec-publications.be/handle/20.500.12860/29271RIE dynamics for extreme wafer thinning applicationsMeeting abstract