Altamirano Sanchez, EfrainEfrainAltamirano SanchezVaglio Pret, AlessandroAlessandroVaglio PretGronheid, RoelRoelGronheidDemand, MarcMarcDemandBoullart, WernerWernerBoullart2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/18471Plasma smoothing of extreme ultraviolet photoresist: LWR reduction at 30nm half pitchOral presentation