Integration of ferroelectric SrBi2Ta2O9-based capacitors in 0.35 μm CMOS technology

Lisoni, JuditJuditLisoniJohnson, JoJoJohnsonGoux, LudovicLudovicGouxSchwitters, MichaelMichaelSchwittersParaschiv, VasileVasileParaschivMaes, DavidDavidMaesHaspeslagh, LucLucHaspeslaghCaputa, ConcettaConcettaCaputaCasella, P.P.CasellaZambrano, R.R.ZambranoVecchio, G.G.VecchioMonchoix, H.H.MonchoixVan Autryve, LucLucVan AutryveWouters, DirkDirkWouters2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9212Integration of ferroelectric SrBi2Ta2O9-based capacitors in 0.35 μm CMOS technologyJournal article