De Bisschop, PeterPeterDe BisschopMuelders, ThomasThomasMueldersKlostermann, UlrichUlrichKlostermannSchmoeller, ThomasThomasSchmoellerBiafore, JohnJohnBiaforeRobertson, Stewart A.Stewart A.RobertsonSmith, MarkMarkSmith2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15160Impact of mask three dimensional effects on resist-model calibrationJournal article