Vaglio Pret, AlessandroAlessandroVaglio PretPoliakov, PavelPavelPoliakovBianchi, DavideDavideBianchiGronheid, RoelRoelGronheidBlomme, PieterPieterBlommeMiranda Corbalan, MiguelMiguelMiranda CorbalanVan Houdt, JanJanVan HoudtDehaene, WimWimDehaene2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/19935Impact of EUV lithography line edge roughness on 16 nm memory generationOral presentation