Resolving In Situ Exposure Dynamics in a Chemically Amplified EUV Photoresist Using Table-Top EUV Photoemission Spectroscopy

Singh, DhirendraDhirendraSinghGalleni, LauraLauraGalleniSajjadian, FaeghehFaeghehSajjadianPollentier, IvanIvanPollentierHolzmeier, FabianFabianHolzmeierPourtois, GeoffreyGeoffreyPourtoisDe Gendt, StefanStefanDe Gendtvan Setten, MichielMichielvan SettenConard, ThierryThierryConardPetersen, JohnJohnPetersenvan der Heide, PaulPaulvan der HeideDorney, KevinKevinDorney2026-02-022026-02-0220251944-8244https://imec-publications.be/handle/20.500.12860/58773engResolving In Situ Exposure Dynamics in a Chemically Amplified EUV Photoresist Using Table-Top EUV Photoemission SpectroscopyJournal article10.1021/acsami.5c09589WOS:001565554200001BASIS-SETSPSEUDOPOTENTIALSMEDLINE:40912685