Dilliway, G.G.DilliwayPierreux, D.D.PierreuxFischer, P.P.FischerMenou, NicolasNicolasMenouPawlak, MalgorzataMalgorzataPawlakWang, Xin PengXin PengWangWouters, DirkDirkWouters2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13668Effect of deposition and anneal temperature on batch-ALD deposited ZrO2/Al2O3/ZrO2 films for DRAM MIM capacitor applicationsProceedings paper