Manufacturability improvements in EUV resist processing towards NXE:3300 processing

Kuwahara, YuheiYuheiKuwaharaMatsunaga, KoichiKoichiMatsunagaShimoaoki, TakeshiTakeshiShimoaokiKawakami, ShinichiroShinichiroKawakamiNafus, KathleenKathleenNafusFoubert, PhilippePhilippeFoubertGoethals, MiekeMiekeGoethalsShimura, SatoruSatoruShimura2021-10-222021-10-222014https://imec-publications.be/handle/20.500.12860/24084Manufacturability improvements in EUV resist processing towards NXE:3300 processingProceedings paperhttp://proceedings.spiedigitallibrary.org/ProceedingBrowse.aspx#VolumeNo