All-wet removal of post-etch photoresist and sidewall residues: Electrical characterization of 90 nm and 30 nm ½ pitch structures

Le, Quoc ToanQuoc ToanLeDemuynck, StevenStevenDemuynckSuhard, SamuelSamuelSuhardKlipp, AndreasAndreasKlippVereecke, BartBartVereeckeVereecke, GuyGuyVereecke2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/17462All-wet removal of post-etch photoresist and sidewall residues: Electrical characterization of 90 nm and 30 nm ½ pitch structuresMeeting abstract