Spectroscopy: A new route towards critical-dimension metrology of the cavity etch of nanosheet transistors

Bogdanowicz, JanuszJanuszBogdanowiczOniki, YusukeYusukeOnikiKenis, KarineKarineKenisMuraki, YusukeYusukeMurakiNuytten, ThomasThomasNuyttenSergeant, StefanieStefanieSergeantFranquet, AlexisAlexisFranquetSpampinato, ValentinaValentinaSpampinatoConard, ThierryThierryConardHoflijk, IlseIlseHoflijkMeersschaut, JohanJohanMeersschautClaessens, NielsNielsClaessensMoussa, AlainAlainMoussaVan Den Heuvel, DieterDieterVan Den HeuvelHung, JoeyJoeyHungKoret, RoyRoyKoretCharley, Anne-LaureAnne-LaureCharleyLeray, PhilippePhilippeLeray2021-10-312021-10-312021https://imec-publications.be/handle/20.500.12860/36524Spectroscopy: A new route towards critical-dimension metrology of the cavity etch of nanosheet transistorsProceedings paperhttps://doi.org/10.1117/12.2581800