Contact hole metrology study: understand the electron beam interaction with photoresist and how to minimize its impact

Zidan, MohamedMohamedZidanLorusso, GianGianLorussoDe Simone, DaniloDaniloDe SimoneSaib, MohamedMohamedSaibMoussa, AlainAlainMoussaBillington, HansHansBillingtonFallica, RobertoRobertoFallicaCharley, Anne-LaureAnne-LaureCharleyDe Gendt, StefanStefanDe Gendt2025-08-032025-08-032025-APR 11932-5150WOS:001523091400013https://imec-publications.be/handle/20.500.12860/46023Contact hole metrology study: understand the electron beam interaction with photoresist and how to minimize its impactJournal article10.1117/1.JMM.24.2.024004WOS:001523091400013