Nucleation of Al2O3 atomic layer deposition on MoS2, a two-dimensional semiconductor

Zhang, HaodongHaodongZhangChiappe, DanieleDanieleChiappeMeersschaut, JohanJohanMeersschautConard, ThierryThierryConardFranquet, AlexisAlexisFranquetRadu, IulianaIulianaRaduVandervorst, WilfriedWilfriedVandervorstDelabie, AnneliesAnneliesDelabie2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/27655Nucleation of Al2O3 atomic layer deposition on MoS2, a two-dimensional semiconductorMeeting abstract