Winroth, GustafGustafWinrothRosseel, ErikErikRosseelDelvaux, ChristieChristieDelvauxAltamirano Sanchez, EfrainEfrainAltamirano SanchezErcken, MoniqueMoniqueErcken2021-10-212021-10-2120131537-1646https://imec-publications.be/handle/20.500.12860/23397Precuring implant photoresists for shrink and patterning controlJournal articlehttp://nanolithography.spiedigitallibrary.org/article.aspx?articleid=1735280