Duval, FabriceFabriceDuvalMeliorisz, BalintBalintMelioriszSlabbekoorn, JohnJohnSlabbekoornMaenhoudt, MireilleMireilleMaenhoudtMiller, AndyAndyMillerUnal, NezihNezihUnalRitter, DanielDanielRitter2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/17047Mask aligner lithography simulationOral presentation