A study of high NA EUV pattern stitching using rigorous stochastic lithography simulation

Robertson, StewartStewartRobertsonSchramm, RobertRobertSchrammPret, Alessandro VaglioAlessandro VaglioPretWiaux, VincentVincentWiaux2024-02-052024-01-132024-02-052023978-1-5106-6748-80277-786XWOS:001125089900002https://imec-publications.be/handle/20.500.12860/43406A study of high NA EUV pattern stitching using rigorous stochastic lithography simulationProceedings paper10.1117/12.2688230978-1-5106-6749-5WOS:001125089900002