Effects of bias, pressure and temperature in plasma damage of ultra low-k films

Urbanowicz, AdamAdamUrbanowiczHumbert, AurelieAurelieHumbertMannaert, GeertGeertMannaertTokei, ZsoltZsoltTokeiBaklanov, MikhaïlMikhaïlBaklanov2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14587Effects of bias, pressure and temperature in plasma damage of ultra low-k filmsProceedings paper