Cluster optimization to improve total CD control as an enabler for double patterning

Tedeschi, LenLenTedeschiRosslee, C.C.RossleeLaidler, DavidDavidLaidlerLeray, PhilippePhilippeLerayD'have, KoenKoenD'have2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14541Cluster optimization to improve total CD control as an enabler for double patterningProceedings paper