Hopf, TobyTobyHopfErcken, MoniqueMoniqueErckenMannaert, GeertGeertMannaertKunnen, EddyEddyKunnenTao, ZhengZhengTaoVandenbroeck, NadiaNadiaVandenbroeckSebaai, FaridFaridSebaaiKikuchi, YoshiakiYoshiakiKikuchiMertens, HansHansMertensKubicek, StefanStefanKubicekDemuynck, StevenStevenDemuynckHoriguchi, NaotoNaotoHoriguchi2021-10-242021-10-242017https://imec-publications.be/handle/20.500.12860/28520CMOS patterning over high-aspect ratio topographies for N10/N7 using spin-on carbon hardmasksProceedings paper10.1117/12.2257668