Combining TEM and 3D scanning spreading resistance microscopy, a hybrid approach, to the analysis of Ge gate-all-around nano-wires

Favia, PaolaPaolaFaviaCelano, UmbertoUmbertoCelanoDrijbooms, ChrisChrisDrijboomsWitters, LiesbethLiesbethWittersArimura, HiroakiHiroakiArimuraCapogreco, ElenaElenaCapogrecoVancoille, EricEricVancoilleBender, HugoHugoBender2021-10-252021-10-252018https://imec-publications.be/handle/20.500.12860/30697Combining TEM and 3D scanning spreading resistance microscopy, a hybrid approach, to the analysis of Ge gate-all-around nano-wiresProceedings paper